Correlation of real-time-monitored process module parameters and wafer results The Gaseous Electronics Conference radio-frequency reference cell: A defined parallel-plate radio-frequency system for experimental and theoretical studies of plasma-processing discharges Etch process characterization using neural network methodology: a case study Process control using new approaches in plasma diagnostics 6 Etching Processes in Semiconductor Manufacturing Process Control Approaches Using Real Time Harmonic Impedance Measurements
